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Kumakura Kazuhide

Research Center for Integrated Quantum ElectronicsSpecially Appointed Professor

Researcher basic information

■ Degree
  • Ph.D. in Engineering, Hokkaido University, Mar. 1998
■ URL
researchmap URLホームページURL■ Various IDs
Researcher number
  • 00393736
ORCID IDResearcher ID
  • C-2432-2011
J-Global ID■ Research Keywords and Fields
Research Keyword
  • semiconductor crystal growth
  • semiconductor devices
  • photoelectrochemical process
  • artificial photosynthesis
  • solar water splitting
Research Field
  • Nanotechnology/Materials, Crystal engineering, 半導体
  • Nanotechnology/Materials, Thin film/surface and interfacial physical properties, 半導体結晶成長

Career

■ Career
Career
  • Oct. 2024 - Present
    Hokkaido University, Research Center for Integrated Quantum Electronics, Specially Appointed Professor, Japan
  • Apr. 2022 - Sep. 2024
    Nippon Telegraph and Telephone Corporation, NTT Basic Research Laboratories, Vice President, Head of NTT Basic Research Laboratories, Japan
  • Oct. 2019 - Mar. 2022
    Nippon Telegraph and Telephone Corporation, Basic Research Laboratories, 企画担当主席研究員、グループリーダー, Japan
  • Jul. 2019 - Sep. 2019
    Nippon Telegraph and Telephone Corporation, Basic Research Laboratories, 企画担当主幹研究員、グループリーダー
  • Apr. 2019 - Jun. 2019
    Nippon Telegraph and Telephone Corporation, Basic Research Laboratories, グループリーダー、主幹研究員, Japan
  • Apr. 2015 - Mar. 2019
    Nippon Telegraph and Telephone Corporation, Basic Research Laboratories, グループリーダー、主幹研究員, 特別研究員, Japan
  • Oct. 2010 - Mar. 2015
    Nippon Telegraph and Telephone Corporation, Basic Research Laboratories, Japan
  • Oct. 2008 - Sep. 2010
    Nippon Telegraph and Telephone Corporation, Basic Research Laboratories, 企画担当 総括担当, Japan
  • Jan. 1999 - Sep. 2008
    Nippon Telegraph and Telephone Corporation, Basic Research Laboratories, Japan
  • Aug. 2007 - Aug. 2008
    Paul-Drude-Institut für Festkörperelektronik, Visiting researcher, Germany
  • Apr. 1998 - Dec. 1998
    Nippon Telegraph and Telephone Corporation, Basic Research Laboratories, Japan
Educational Background
  • Apr. 1995 - Mar. 1998, Hokkaido University, Graduate School of Engineering, 電子情報工学専攻 博士後期課程, Japan
  • Apr. 1993 - Mar. 1995, Hokkaido University, Graduate School of Engineering, 電気工学専攻 修士課程, Japan
  • Apr. 1989 - Mar. 1993, Hokkaido University, School of Engineering, Japan
Committee Memberships
  • 2023 - 2024
    National Institutes for Quantum Science and Technology, Advisory board, Others
  • 2024
    The 43rd Electronic Materials Symposium (EMS-43), Steering Committee Member, Society
  • 2023
    The 42nd Electronic Materials Symposium (EMS-42), Steering Committee Member, Society
  • 2018
    19th International Conference on Metalorganic Vapor Phase Epitaxy (ICMOVPE-XIX), Program Committee Members, Society
  • 2014
    2014 International Conference on Solid State Devices and Materials (SSDM 2014), Program Subcommittee Members, Society
  • 2013
    2013 International Conference on Solid State Devices and Materials (SSDM 2013), Program Subcommittee Members, Society
  • 2013
    International Symposium on Compound Semiconductors, Guest Editor, Society
  • 2007
    The 26th Electronic Materials Symposium (EMS-26), Accounting Committee Member, Society
  • 2006
    The 25th Electronic Materials Symposium (EMS-25), Accounting Committee Member, Society

Research activity information

■ Awards
  • Sep. 2000, The Japan Society of Applied Physics, Young Scientist Presentation Award
    High Hole Concentration Realized by Mg-doped InGaN and InGaN/GaN Superlattices
    Kazuhide Kumakura
■ Papers
■ Other Activities and Achievements
■ Lectures, oral presentations, etc.
  • NiO助触媒を担持したGaN系光陽極を用いた光水分解特性
    熊倉 一英; 山下 雄大; 平間 一行; 谷保 芳孝; 佐藤 威友
    電子情報通信学会 研究会(ED, CPM, LQE), 21 Nov. 2025, Japanese, Oral presentation
    20 Nov. 2025 - 21 Nov. 2025
  • GaNAsシェル膜厚によるGaAs/GaNAsコアーシェルナノワイヤ光学特性制御
    塩見 悠介; 佐野 真浩; 峰久 恵輔; 山下 雄大; 谷保 芳孝; 平間 一行; 熊倉 一英; 石川 史太郎
    第61回応用物理学会 北海道支部, 01 Nov. 2025, Japanese, Oral presentation
    01 Nov. 2025 - 02 Nov. 2025
  • 電気化学測定法によるud-AlGaN/n-GaN構造の電気的評価
    高橋 円空; 嶋﨑 喬大; 赤澤 怜明; 熊倉 一英; 谷保 芳孝; 佐藤 威友
    第86回 応用物理学会 秋季学術講演会, 10 Sep. 2025, Japanese, Poster presentation
    07 Sep. 2025 - 10 Sep. 2025
  • c-BScNエピタキシャル薄膜のスパッタリング成長機構
    前田 亮太; 谷保 芳孝; 熊倉 一英; 二宮 翔; 西堀 麻衣子; 平間 一行
    第86回 応用物理学会 秋季学術講演会, 09 Sep. 2025, Japanese, Oral presentation
    07 Sep. 2025 - 10 Sep. 2025
  • InGaN光電極とNiO助触媒界面のバンドアライメント
    山下 雄大; 熊倉 一英; 平間 一行; 谷保 芳孝
    第86回 応用物理学会 秋季学術講演会, 09 Sep. 2025, Japanese, Oral presentation
    07 Sep. 2025 - 10 Sep. 2025
  • I-V, C-V測定から求めたAlNショットキーバリアダイオードの障壁高さの温度依存性
    佐々木 一晴; 廣木 正伸; 熊倉 一英; 平間 一行; 谷保 芳孝; 前田 拓也
    第86回 応用物理学会 秋季学術講演会, 08 Sep. 2025, Japanese, Oral presentation
    07 Sep. 2025 - 10 Sep. 2025
  • GaAs/GaNAsコア-シェルナノワイヤ光吸収特性のGaNAsシェル膜厚依存性
    塩見 悠介; 佐野 真浩; 峰久 恵輔; 山下 雄大; 谷保 芳孝; 平間 一行; 熊倉 一英; 石川 史太郎
    第17回ナノ構造エピタキシャル成長講演会, 18 Jul. 2025, Japanese, Poster presentation
    17 Jul. 2025 - 19 Jul. 2025
  • AlN基板上AlNショットキーバリアダイオードの障壁高さの温度依存性
    佐々木 一晴; 廣木 正伸; 熊倉 一英; 平間 一行; 谷保 芳孝; 前田 拓也
    第17回ナノ構造エピタキシャル成長講演会, 17 Jul. 2025, Japanese, Poster presentation
    17 Jul. 2025 - 19 Jul. 2025
  • AlN系分極ドープFETの高周波特性
    川崎 晟也; 廣木 正伸; 平間 一行; 熊倉 一英; 谷保 芳孝
    第72回 応用物理学会 春季学術講演会, 17 Mar. 2025, Japanese, Oral presentation
    14 Mar. 2025 - 17 Mar. 2025
  • 組成傾斜 AlGaN コンタクト層を有する AlN SBD における電流輸送機構の解明
    前田 拓也; 若本 裕介; 佐々木 一晴; 棟方 晟啓; 廣木 正伸; 平間 一行; 熊倉 一英; 谷保 芳孝
    第72回 応用物理学会 春季学術講演会, 17 Mar. 2025, Japanese, Oral presentation
    14 Mar. 2025 - 17 Mar. 2025
  • 順バイアス印加AlNショットキーバリアダイオードのエミッション顕微鏡観察
    佐々木 一晴; 廣木 正伸; 熊倉 一英; 平間 一行; 谷保 芳孝; 田中 敦之; 本田 善央; 中野 義昭; 前田 拓也
    第72回 応用物理学会 春季学術講演会, 17 Mar. 2025, Japanese, Oral presentation
    14 Mar. 2025 - 17 Mar. 2025
  • 立方晶窒化ホウ素スカンジウム(c-BScN)薄膜のマグネトロンスパッタリング成長
    前田 亮太; 谷保 芳孝; 熊倉 一英; 平間 一行
    第72回 応用物理学会 春季学術講演会, 17 Mar. 2025, Japanese, Oral presentation
    14 Mar. 2025 - 17 Mar. 2025
  • III族極性InNのMOVPE成長における結晶成長相図
    山下 雄大; 熊倉 一英; 平間 一行; 谷保 芳孝
    第72回 応用物理学会 春季学術講演会, 16 Mar. 2025, Japanese, Oral presentation
    14 Mar. 2025 - 17 Mar. 2025
■ Affiliated academic society
■ Research Themes
  • Novel molecular layer epitaxy on a step-free III-nitride surface
    Grants-in-Aid for Scientific Research
    01 Apr. 2016 - 31 Mar. 2019
    Akasaka Tetsuya
    We have proposed a novel molecular layer epitaxy for fabricating group-III-nitride-based hetero-structures having atomically smooth hetero-interfaces. We have also optimized growth conditions of InN thin films in metalorganic vapor phase epitaxy and succeeded in fabricating N-face GaN/InN/GaN double hetero-structures. We have fabricated GaN/AlN hetero-structures and observed the Landau level quantization by gate tuning, which is a clear evidence showing the high-quality hetero-interface in the GaN/AlN hetero-structure.
    Japan Society for the Promotion of Science, Grant-in-Aid for Scientific Research (B), NTT Basic Research Laboratories, 16H03862
  • Mechanical transfer of GaN-based devices using layered BN
    Grants-in-Aid for Scientific Research
    01 Apr. 2014 - 31 Mar. 2018
    Kobayashi Yasuyuki; KUMAKURA KAZUHIDE; HIROKI MASANOBU
    We grew single-crystal GaN films on 100-nm-thick AlN buffer layers that were grown on 3-nm-thick hexagonal boron nitride (h-BN) buffer layers on (0001) sapphire substrates with plasma-assisted molecular beam epitaxy (MBE). X-ray diffraction for the GaN film revealed that the AlN layer on the h-BN layer enabled the crystalline quality of GaN film on it to be greatly improved. Streaky reflection high energy electron diffraction pattern for the GaN film indicated that the single crystal (0001) GaN thin film with a flat surface was grown on the AlN/h-BN buffer layer. MBE has a promising as the growth technology for high-quality GaN thin films grown on the h-BN buffer layers.
    Japan Society for the Promotion of Science, Grant-in-Aid for Scientific Research (A), Hirosaki University, 26246015
  • Research on AlN-based heterostructure growth and UV light-emitting devices
    Grants-in-Aid for Scientific Research
    01 Apr. 2013 - 31 Mar. 2017
    Taniyasu Yoshitaka
    Growth mechanism, doping property and optical property of AlN-based semiconductor and its heterostructures were studied. We developed these single-crystal growth technology, high-efficiency doping, and device fabrication. We achieved high-efficiency AlN-based LED and photo-pumped deep-UV lasing from AlGaN quantum wells. We also developed a growth method for single-crystal cubic BN, which is able to make new heterostructures with AlN and Diamond. These results will contribute to further developments of AlN-based materials and devices, and crystal growth technologies for creating new materials.
    Japan Society for the Promotion of Science, Grant-in-Aid for Scientific Research (A), NTT Basic Research Laboratories, 25246022